Original
Sequential microcontroller-based control for a chemical vapor deposition process
Edgar Serrano Péreza,
, Javier Serrano Pérezb, Fernando Martínez Piñóna, José Manuel Juárez Garcíac, Omar Serrano Pérezd, Fernando Juárez Lópeza
Corresponding author
a Instituto Politécnico Nacional, CIITEC, Cerrada de Cecati, Sta. Catarina, D.F. 02250, Mexico
b Universidad Tecnológica de Tecámac, Carretera Federal México – Pachuca, Km. 37.5, Predio Sierra Hermosa, C.P. 55740, Tecámac, Estado de Mexico, Mexico
c Centro Nacional de Metrología, Km 4.5 Carretera a Los Cués, C.P. 76246 Municipio El Marqués, Querétaro, Mexico
d Departamento de Posgrado, Instituto Politécnico Nacional, CIDETEC, Av. Juan de Dios Bátiz s/n, 07700 Ciudad de México, Mexico
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